Hollowed electronic display

ABSTRACT

Presented here are manufacturing techniques to create an irregularly shaped electronic display, including a hollow within which a sensor, such as a camera, can be placed. The manufacturing techniques enable the creation of the hollow anytime during the manufacturing process. The resulting electronic display occupies the full side of the mobile device, with the sensors placed within and surrounded by the display.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. utility patent applicationSer. No. 15/233,818, filed Aug. 10, 2016, which claims priority to U.S.provisional patent application Ser. No. 62/348,421, filed Jun. 10, 2016,all of which are incorporated herein in their entirety and by thisreference thereto.

TECHNICAL FIELD

The present application is related to manufacturing of electronicdisplays and, more specifically, to methods and systems to manufacturehollowed electronic displays.

BACKGROUND

Electronic displays disposed on a side of mobile devices of today do notoccupy the full side of the mobile device because certain areas of themobile device are reserved for various sensors, such as a camera,ambient light sensor, proximity sensor, etc. The areas containing thesensors are considerably larger than the sensors, and those areas do notfunction as a part of the display. As a result, the size of theelectronic display is reduced. Further, the manufacturing techniquesused in the creation of the electronic displays are optimized formanufacture of rectangular electronic displays.

SUMMARY

Presented here are manufacturing techniques to create an irregularlyshaped electronic display, including a hollow within which a sensor,such as a camera, can be placed. The manufacturing techniques enable thecreation of the hollow anytime during the manufacturing process. Theresulting electronic display occupies the full side of the mobiledevice, with the sensors placed within and surrounded by the display.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A is a flowchart of a method to create a hollowed electronicdisplay and place a sensor, such as a camera, an ambient light sensor,and/or a proximity sensor, inside the hollow, according to oneembodiment.

FIG. 1B shows the distribution pattern associated with the plurality ofrow and column electrodes, according to one embodiment.

FIG. 2A is a flowchart of a method to create a hollowed electronicdisplay and place a sensor, such as a camera, an ambient light sensor,and/or a proximity sensor, inside the hollow, according to anotherembodiment.

FIG. 2B shows an exposure of a substrate to light using a photomask,according to one embodiment.

FIG. 2C shows the modified photomask, according to one embodiment.

FIG. 3 shows a sensor disposed within a hollow associated with anelectronic display, according to one embodiment.

FIG. 4 shows a side view of the sensor disposed within the hollowassociated with the electronic display, according to one embodiment.

FIG. 5 shows a circular hollow associated with the electronic display,according to one embodiment.

FIG. 6 shows a rectangular hollow associated with the electronicdisplay, according to one embodiment.

FIG. 7 shows a sealant disposed on a layer associated with theelectronic display, according to one embodiment.

DETAILED DESCRIPTION

Technology

Presented here are manufacturing techniques to create an irregularlyshaped electronic display, including a hollow within which a sensor,such as a camera, can be placed. The manufacturing techniques enable thecreation of the hollow anytime during the manufacturing process. Theresulting electronic display occupies the full side of the mobiledevice, with the sensors placed within and surrounded by the display.

The process of making electronic displays, such as liquid crystaldisplays (LCDs), organic light emitting diode (OLED) displays, andmicro-electromechanical system (MEMS) displays, involves the creation ofmultiple layers. Multiple layers include a thin film transistor (TFT)layer, a color filter (CF) layer, and a display layer, which includesdisplay elements such as liquid crystals, OLEDs, MEMS, etc. Each TFT inthe TFT layer is connected to an intersection of rows and columns ofelectrodes. The rows of electrodes are connected to a first integratedcircuit, called the row driver, which determines which electrode rows toactivate by applying voltage to the ends of the row electrode. Thecolumns of electrodes are connected to a second integrated circuit, thecolumn driver, which determines which electrode columns to activate byapplying voltage to the ends of the column electrode. The TFT isactivated when both the row and the column electrode are activated. Whenthe TFT is activated, the TFT in turn activates a corresponding displayelement which transmits light. The light, transmitted by the displayelement, is colored by a corresponding color region in the CF layer toproduce any color in the visible spectrum. In addition, the lighttransmitted by the display element can include a frequency outside ofthe visible spectrum, such as infrared (IR). A group of one TFT, acorresponding display element, and a corresponding color regionassociated with the CF layer form a sub pixel.

Creating the TFT layer includes multiple steps. First, thin filmtransistors (TFTs) are deposited onto a substrate, such as a glasssubstrate or a plastic substrate. Afterwards, a photoresist coating isplaced on the TFT coating.

In the photo development step, the photoresist coating is exposed tolight, such as ultraviolet (UV) light. A photomask is used toselectively shade the photoresist coating from the light. The pattern onthe photomask is transferred onto the photoresist coating. The photodevelopment step varies based on the type of the photoresist coating.Photoresist coating can be either positive or negative. When thephotoresist coating is positive, the photo development process removesthe photoresist coating that was exposed to the light. When thephotoresist coating is negative, the photo development process removesthe photoresist coating that was not exposed to the light.

The etching step removes the TFT coating that is not protected by thephotoresist. The stripping step removes the remaining photoresistcoating from the TFTs by spraying organic solvent onto the substrate,thus leaving only the TFTs on the substrate in the areas that wereprotected by the photoresist coating during the etching step.

Creation of the TFT layer can include steps in addition to the stepsdescribed herein. Further, one or more of the steps described herein canbe repeated multiple times.

Creating the CF layer involves multiple steps, some of which aredescribed herein. First, a black photoresist is deposited on asubstrate, such as a glass substrate. Next, the black photoresist on thesubstrate is treated with heat to remove solvents. The black photoresistis exposed to light through a photomask. The shape of the photomask canbe grid-like, or a modified grid with various shapes added to the grid.The black photoresist is exposed to light, such as the UV light, throughthe photomask. In the photo development step, either the photoresistthat was exposed to the light (positive photoresist) or the photoresistthat was not exposed to the light (negative photoresist) is removed.

Next, the color regions, such as red, green, blue, cyan, magenta,yellow, white, infrared (IR), etc., are added to the substrate with theremaining black photoresist. The substrate is coated with a single colorphotoresist, such as a red photoresist, and prebaked to remove solvents.The red photoresist is exposed to light through a photomask. Thephotomask can take on various shapes. In the photo development step,either the red photoresist that was exposed to the light (positivephotoresist) or the red photoresist that was not exposed to the light(negative photoresist) is removed from the substrate. To add additionalcolors, such as green, blue, cyan, magenta, yellow, white, infrared(IR), etc., the substrate is coated with a green photoresist and a bluephotoresist, and the steps of exposure and photo development arerepeated.

Creating the display layer includes depositing sealant on either the TFTlayer or the CF layer. The shape of the sealant defines the perimeter ofthe electronic display. Inside the sealant, display elements aredeposited, such as liquid crystals, OLEDs, MEMS, etc.

FIG. 1A is a flowchart of a method to create a hollowed electronicdisplay and place a sensor, such as a camera, an ambient light sensor,and/or a proximity sensor, inside the hollow, according to oneembodiment. In this method, a hollow is created in the electronicdisplay before depositing the various elements such as color regions,the TFTs, the display elements, etc. on various substrates.

In step 100, a mask associated with a plurality of layers in anelectronic display is provided. The electronic display can be a flatpanel display and include a color filter (CF) layer, a thin filmtransistor (TFT) layer, and a display layer. Each layer in the pluralityof layers can have substantially the same shape. The mask can be shapedlike a circle, an ellipse, a square, a rectangle, a square with one ormore rounded corners, a rectangle with one or more rounded corners, etc.The mask can be disposed anywhere on the electronic display, such asproximate to a top edge associated with the electronic display, in themiddle of the electronic display, in a corner associated with electronicdisplay, along the sides of the electronic display, etc.

In one embodiment, the edge of the mask traces a sub pixel boundary.Given that the size of a sub pixel is significantly smaller than thesize and curvature of the mask, the edge of the mask appears smooth, andno sub pixel outline is visible along the mask edge. In anotherembodiment, shown in FIG. 1B, the edge of the mask does not align withthe sub pixel boundary.

In step 110, a hollow corresponding to the mask is removed from a CFsubstrate associated with the CF layer and from a TFT substrateassociated with the TFT layer to create a hollowed substrate. Thehollowed substrate includes a CF substrate and a hollowed TFT substrate.Removing the hollow corresponding to the mask can be done in variousways, including cutting and/or etching. Cutting the hollow can be donewith a laser or a diamond saw. The laser can be a Corning LaserTechnologies laser, which cuts the glass with ultra-short laser pulseslasting several picoseconds. Etching can be done by coating the CFsubstrate and the TFT substrate with an etching-resistant coating. Theetching-resistant coating is distributed everywhere on the CF substrateand the TFT substrate, except for the hollow corresponding to the mask.The coated CF substrate and the coated TFT substrate are submerged inthe etcher, which removes the substrate in the uncoated areas. In thenext step, the etching-resistant coating is removed from both the CFsubstrate and the TFT substrate.

In step 120, a plurality of colors are distributed on the hollowed CFsubstrate. The CF substrate can be made out of various materials, suchas glass, plastic, etc. The plurality of colors are distributed tofollow the outline of the hollowed CF substrate, without depositing anycolors in the substrate hollow corresponding to the mask. The colors arefilters that pass various frequency bands of the electromagneticspectrum, such as red, green, blue, white, infrared (IR), cyan, magenta,yellow, etc.

In step 130, a plurality of thin film transistors is disposed on thehollowed TFT substrate. The TFT substrate can be made out of variousmaterials, such as glass, plastic, etc. The plurality of TFTs aredistributed to follow the outline of the hollowed TFT substrate, withoutdepositing any TFTs in the substrate hollow corresponding to the mask.

In step 140, a plurality of row and column electrodes corresponding tothe plurality of thin film transistors are distributed such that eachrow and column electrode in the plurality of row and column electrodesinterrupted by the hollow partially follows a perimeter associated withthe hollow. The distribution pattern is further explained in FIG. 1B.Step 140 can be performed before the plurality of TFTs are deposited onthe TFT substrate, and/or after the plurality of TFTs are deposited onthe TFT substrate.

In step 150, the CF layer and the TFT layer are combined to obtain theelectronic display. The electronic display comprises a hollowcorresponding to the mask. The hollow can have the same shape as themask. Combining the CF layer and the TFT layer includes depositing asealant on either the CF layer or the TFT layer. Depositing the sealantincludes tracing the perimeter of the hollowed substrate. Once thesealant is deposited, the display elements are deposited inside the areaenclosed by the sealant. The display elements can be liquid crystals,OLEDs, or MEMS.

In step 160, a sensor, such as a camera, an ambient light sensor, and/ora proximity sensor, is disposed inside the hollow such that the top ofthe sensor is aligned with the top of the electronic display. Forexample, the top of the camera comprises a lens associated with thecamera. The camera lens is aligned with the top of the electronicdisplay and placed beneath a cover glass associated with an electronicdevice.

FIG. 1B shows the distribution pattern associated with the plurality ofrow and column electrodes, according to one embodiment. The plurality ofrow electrodes 170 (only one row electrode labeled for brevity) and theplurality of column electrodes 180 (only one column electrode labeledfor brevity) are distributed on the substrate in a modified grid-likepattern circumventing the hollow 190 corresponding to the mask. A thinfilm transistor 105 is disposed at an intersection of a row electrodeand a column electrode (only one thin film transistor is labeled forbrevity). Segment 125 of the row electrode 115 interrupted by the hollow190 partially follows the perimeter associated with the hollow 190.There can be multiple row electrodes interrupted by the hollow 190.Similarly, segments 165, 175, 185 of the respective column electrodes135, 145, 155 interrupted by the hollow 190 partially follow theperimeter associated with the hollow 190.

The mask corresponding to the hollow 190 does not follow a sub pixelboundary, and the formation of the hollow 190 creates an area 195 ofpartially formed pixels. The area 195 is bounded by the sub pixelboundary 197. The area 195 comprising the partially formed sub pixels isnot part of the electronic display, and is used to layout the rowelectrode segment 125 and the plurality of column electrode segments165, 175, 185 to circumvent the hollow 190.

FIG. 2A is a flowchart of a method to create a hollowed electronicdisplay and place a sensor, such as a camera, an ambient light sensor,and/or a proximity sensor, inside the hollow, according to anotherembodiment. In this method, a hollow is created in the electronicdisplay after depositing the various elements such as color regions, theTFTs, the display elements, etc. on various substrates. In this method,there is no need to modify the manufacturing machinery to avoiddepositing the various elements inside the hollow formed within thesubstrates. Even though depositing the various elements inside thehollow increases the amount of discarded material, the low cost of thediscarded material, and the lack of need to modify the manufacturingmachinery make this method cost-efficient.

In step 200, a mask corresponding to a plurality of layers in theelectronic display is provided. The electronic display can be a flatpanel display and include a color filter (CF) layer, a thin filmtransistor (TFT) layer, a polarizer layer, and a display layer. Eachlayer in the plurality of layers can have substantially the same shape.The mask can be shaped like a circle, an ellipse, a square, a rectangle,a square with one or more rounded corners, a rectangle with one or morerounded corners, etc. The mask can be disposed anywhere on theelectronic display, such as proximate to a top edge associated with theelectronic display, in the middle of the electronic display, in a cornerassociated with electronic display, along the sides of the electronicdisplay, etc.

In one embodiment, the edge of the mask traces a sub pixel boundary.Given that the size of a sub pixel is significantly smaller than thesize and curvature of the mask, the edge of the mask appears smooth, andno sub pixel outline is visible along the mask edge. When the edge ofthe mask traces the sub pixel boundary, only regions corresponding towhole sub pixels are removed, and no partially formed sub pixels remain.

In another embodiment, the edge of the mask does not trace the sub pixelboundary. Once a hollow corresponding to the mask is removed from thesubstrate, the partially formed sub pixels do not function as part ofthe display. Instead, the area 195 in FIG. 1B comprising the partiallyformed sub pixels is used to layout the plurality of row and columnelectrodes in a pattern circumventing the hollow, as shown in FIG. 1B.

In step 210, the CF layer is provided. The CF layer includes a CFsubstrate and a plurality of color regions disposed on the CF substrate.The substrate can be made out of various materials such as glass,plastic, etc. The color regions are filters that pass various bands ofthe electromagnetic spectrum such as red, green, blue, white, infrared(IR), cyan, magenta, yellow, etc.

Providing the CF substrate includes depositing a colored photoresistcoating onto the CF substrate. The colored photoresist coating includesfilters that pass various bands of the electromagnetic spectrum such asred, green, blue, white, infrared (IR), cyan, magenta, yellow, black,etc.

The colored photoresist is exposed to light, such as the UV light,through a photomask. FIG. 2B shows an exposure of a substrate to lightusing a photomask, according to one embodiment. A light source 245transmits light, such as the UV light, and illuminates the substrate 265through the photomask 255. The substrate 265 can be the CF substrate,the TFT substrate, etc. The pattern on the photomask 255 is transferredonto the photoresist coating to form a pattern 275.

The photomask can take on various shapes. In one embodiment, thephotomask is modified based on the provided mask. FIG. 2C shows themodified photomask, according to one embodiment. Element 270 is theunmodified photomask, including the plurality of protected areas 280(only one of which is labeled in the figure for brevity), and theplurality of unprotected areas 290 (only one of which is labeled in thefigure for brevity). Element 205 corresponds to the mask used inmodifying the photomask 270. The modified mask 215 includes a pluralityof protected areas 225 (only one of which is labeled in the figure forbrevity), and a plurality of unprotected areas 235 (only one of which islabeled in the figure for brevity), where the plurality of unprotectedareas 235 include the mask 205.

Finally, the plurality of unprotected areas 235 are removed from thesubstrate using a photo development process. In the photo developmentstep, if the photoresist is positive, the photoresist that is exposed tothe light is removed from the substrate, and if the photo is negative,the photoresist that is not exposed to the light is removed from thesubstrate. To add additional colors, such as green, blue, yellow,magenta, black, white, cyan, IR, etc., the substrate is coated with anappropriately colored photoresist, and the steps of exposure and photodevelopment are repeated.

In step 220 of FIG. 2A, a display layer is provided, which includes aplurality of display elements disposed between the CF layer and the TFTlayer. The plurality of display elements are configured to transmitlight and can include liquid crystals, OLEDs, MEMS, etc. Providing thedisplay layer includes depositing a sealant, and depositing a pluralityof display elements inside the sealant. The sealant is deposited on alayer in the plurality of layers, such as the CF layer or the TFT layer.The shape of the sealant traces at least a partial outline associatedwith the electronic display, element 730 in FIG. 7, and an outlineassociated with the mask, element 740 in FIG. 7. The display elementsare deposited inside the outline defined by the sealant.

In step 230 of FIG. 2A, the TFT layer is provided, which includes a TFTsubstrate and a plurality of transistors disposed on the TFT substrate.The TFT substrate can be made out of various materials such as glass,plastic, etc. Providing the TFT layer includes depositing TFTs,depositing a photoresist coating, modifying a photomask, and removing aplurality of unprotected areas from the substrate. Initially, TFTs aredeposited onto the TFT substrate. A photoresist coating is deposited onthe thin film transistors. The photoresist is exposed to light, such asthe UV light, through a photomask, as shown in FIG. 2B and describedherein. The photomask can take on various shapes. In one embodiment, thephotomask is modified based on the provided mask, as shown in FIG. 2Cand described herein. The photomask includes a plurality of protectedareas and a plurality of unprotected areas.

Finally, the plurality of unprotected areas are removed to leave TFTsdisposed on the TFT substrate in the plurality of protected areas. Theremoval of the unprotected areas can be done using photo development,etching and stripping. In the photo development step, either thephotoresist that was exposed to the light (positive photoresist) or thephotoresist that was not exposed to the light (negative photoresist) isremoved from the substrate. In the etching step, the TFTs in the areaswhere the photoresist was removed are etched away, leaving only TFTs andthe photoresist coating in the plurality of protected areas. In thestripping step, the photoresist is removed from the substrate, leavingonly TFTs in the plurality of protected areas.

In addition, providing the TFT layer includes distributing a pluralityof row and column electrodes corresponding to the plurality of thin filmtransistors such that each row and column electrode in the plurality ofrow and column electrodes interrupted by the hollow partially follows aperimeter associated with the hollow. The distribution pattern isfurther explained in FIG. 1B. Distributing the plurality of row andcolumn electrodes can be performed before the plurality of TFTs aredeposited on the TFT substrate, and/or after the plurality of TFTs aredeposited on the TFT substrate.

In step 240, a hollow is removed from the CF layer, the display layer,the polarizer layer, and the TFT layer, wherein the removed hollowcorresponds to the provided mask. Since the edge of the mask traces thesub pixel boundary, only regions corresponding to whole sub pixels areremoved, and no partially formed sub pixels remain. Removing the hollowcorresponding to the mask can be done in various ways, including cuttingand/or etching. Cutting the hollow can be done with a laser or a diamondsaw. The laser can be a Corning Laser Technologies laser, which cuts theglass with ultra-short laser pulses lasting several picoseconds. Etchingcan be done by coating the CF substrate, the display layer, thepolarizer layer, and the TFT substrate with an etching-resistantcoating. The etching-resistant coating is distributed everywhere on theCF layer, the display layer, the polarizer layer, and the TFT layer,except for the hollow corresponding to the mask. The coated CF layer,the coated display layer, the coated polarizer layer, and the coated TFTlayer are submerged in the etcher, such as a chemical etcher, whichremoves the substrate in the uncoated areas. In the next step, theetching-resistant coating is removed from the CF substrate, the displaylayer, the polarizer layer, and the TFT substrate. In one embodiment,the polarizer layer is specially manufactured to be stamped with apolarizing material, where the stamp is in the shape of the hollowedsubstrate. By stamping the polarizer to exclude the mask, the amount ofpolarizing material discarded is reduced.

In step 250, the CF layer, the display layer, and the TFT layer arecombined to obtain a combined layer. Step 240 can be performed beforestep 250. That is, the hollow can be removed from each layer in theelectronic display separately. Alternatively, step 240 can be performedafter step 250, meaning that the hollow can be removed once from thecombined layer.

In step 260, a sensor, such as a camera, an ambient light sensor, and/ora proximity sensor, is disposed inside the removed hollow, with the topof the sensor aligned with the top of the electronic display. Forexample, the top of the camera comprises a lens associated with thecamera. The camera lens is aligned with the top of the electronicdisplay and placed beneath a cover glass associated with an electronicdevice.

FIG. 3 shows a sensor disposed within a hollow associated with anelectronic display, according to one embodiment. An electronic display300, such as a flat panel display, includes a color filter (CF) layer310, a display layer 320, a thin film transistor (TFT) layer 330, and asensor 340, such as a camera, an ambient light sensor, and/or aproximity sensor. The electronic display 300 can include additionallayers, such as a polarizer layer, a light guide plate, a diffuserlayer, etc. The display layer 320 can include liquid crystals, organiclight emitting diodes, or micro-electromechanical system (MEMS) devices.The sensor 340 is disposed within a hollow 350 formed in the electronicdisplay 300. The hollow 350 can take on different shapes, such as arectangular shape with one or more rounded corners, as shown in FIG. 3.In addition, the hollow 350 can take on a rectangular shape with sharpcorners, an elliptical shape, a circular shape, a square shape, etc. Atop surface of the sensor 340 can be disposed at the same height as thetop surface of the electronic display 300. Also, the top surface of thesensor 340 can be slightly recessed from the top surface of theelectronic display 300. The sensor 340 is optically isolated from theelectronic display 300 so that light from the electronic display 300does not reach the sensor 340. The sensor 340 can be isolated using anoptically opaque material surrounding the sensor 340 and extending tothe cover glass.

FIG. 4 shows a side view of the sensor disposed within the hollowassociated with the electronic display, according to one embodiment.Cover glass 400 is disposed above the electronic display 410 and thesensor 340. The top surface of the sensor 340 and the top surface of theelectronic display 410 can be at the same height. Also, the top surfaceof the sensor 340 can be slightly recessed from the top surface of theelectronic display 410, thus forming an air gap 490 between the topsurface of the sensor 340 and the cover glass 400. In anotherembodiment, the electronic display 410 includes a top polarizer layer420, a CF layer 430, a display layer 440, a TFT layer 450, a bottompolarizer layer 460, a diffuser 470, a light guide plate 480, and thesensor 340. The display layer 440 can include liquid crystals, organiclight emitting diodes, or micro-electromechanical system (MEMS) devices.The sensor 340 is optically isolated from the electronic display 410 sothat light from the electronic display 410 does not reach the sensor340. The sensor 340 can be isolated using an optically opaque materialsurrounding the sensor 340 and extending to the cover glass 400.

FIG. 5 shows a circular hollow associated with the electronic display,according to one embodiment. The circular hollow 500 is formed inside anelectronic display 510. The circular hollow 500 can be placed anywhereon the electronic display 510, such as the forehead 520 associated withthe electronic display 510, as shown in FIG. 5, as well as the middle ofthe electronic display 510, middle left portion of the electronicdisplay 510, middle right portion of the electronic display 510, bottomportion of the electronic display 510, etc. The sensor 340 is placedinside the circular hollow 500. The hollow on all sides is surrounded bythe active electronic display 510.

FIG. 6 shows a rectangular hollow associated with the electronicdisplay, according to one embodiment. The rectangular hollow 600 withtwo round angles is formed inside the electronic display 610. Therectangular hollow 600 can be placed anywhere on the electronic display610, such as the forehead of the electronic display 610, the bottom leftcorner, the bottom right corner, middle left side, mid-right side, etc.When the rectangular hollow 600 is placed close to one edge associatedwith the electronic display 610, such as the edge 620, a thin portion630 of the electronic display 610 formed between the rectangular hollow600 and the edge 620 does not include active display elements. Instead,the thin portion 630 serves as a structural support for the electronicdisplay 610. In one embodiment, a plurality of glue beads 640 are placedon the surface of the thin portion 630 to further provide structuralsupport for the electronic display 610. In another embodiment, a sealantis placed on the surface of the thin portion 630 to further providestructural support for the electronic display 610.

FIG. 7 shows a sealant disposed on a layer associated with theelectronic display, according to one embodiment. The dispenser 720disposes the sealant 700 on a layer 710 associated with the electronicdisplay, such as the CF layer or the TFT layer. The shape of the sealant700 traces the contour 730 of the electronic display and the contour 740of the hollow. The sealant section 750 is optional and can be removed insome embodiments. When added, the sealant section 750 providesadditional structural support to the electronic display. Displayelements, such as liquid crystals, organic light emitting diodes, orMEMS, are deposited inside area 760. In other embodiments, the displayelements are deposited inside the contour 730 of the electronic display,including the area defined by the contour 740 of the hollow.

Remarks

The language used in the specification has been principally selected forreadability and instructional purposes, and it may not have beenselected to delineate or circumscribe the inventive subject matter. Itis therefore intended that the scope of the invention be limited, not bythis Detailed Description but rather by any claims that issue on anapplication based hereon. Accordingly, the disclosure of variousembodiments is intended to be illustrative, but not limiting, of thescope of the embodiments, which is set forth in the following claims.

The invention claimed is:
 1. A method comprising: providing a mask associated with a plurality of layers in an electronic display, wherein the plurality of layers comprises a color filter (CF) layer and a thin film transistor (TFT) layer; forming a hollow corresponding to the mask within a CF substrate associated with the CF layer, and a TFT substrate associated with the TFT layer to create a hollowed substrate, the hollowed substrate comprising a hollowed CF substrate and a hollowed TFT substrate; distributing a plurality of colors on the hollowed CF substrate; distributing a plurality of thin film transistors on the hollowed TFT substrate; distributing a plurality of row and column electrodes corresponding to the plurality of thin film transistors such that each row and column electrode in the plurality of row and column electrodes interrupted by the hollow circumvents the hollow; combining the CF layer and the TFT layer to obtain the electronic display, wherein the electronic display comprises the hollow; and disposing a sensor inside the hollow.
 2. The method of claim 1, said combining the CF layer and the TFT layer, comprising: depositing a sealant on a layer in the plurality of layers, said depositing comprising tracing an outline associated with the hollowed substrate.
 3. The method of claim 2, further comprising: depositing a plurality of liquid crystal beads inside the outline.
 4. The method of claim 1, wherein said forming the hollow comprises: defining with a laser the hollow within the CF layer and the TFT layer, wherein the hollow associated with the CF layer and the TFT layer corresponds to the mask.
 5. The method of claim 1, wherein the mask comprises a rectangular shape with at least two rounded corners.
 6. The method of claim 1, wherein the mask comprises a circular shape.
 7. The method of claim 1, wherein the mask is disposed proximate to a top edge associated with the electronic display.
 8. A method comprising: providing a mask corresponding to a plurality of layers in an electronic display, wherein the plurality of layers comprises a color filter (CF) layer, a display layer, and a thin film transistor (TFT) layer; providing the CF layer comprising a CF substrate and a plurality of color regions disposed on the CF substrate; providing the display layer comprising a plurality of display elements disposed between the CF layer and the TFT layer, the plurality of display elements configured to transmit light; providing the TFT layer comprising a TFT substrate and a plurality of transistors disposed on the TFT substrate; forming a hollow within the CF layer, the display layer, and the TFT layer, wherein the hollow associated with the CF layer, the display layer, and the TFT layer, corresponds to the mask; sealing the CF layer, the display layer, and the TFT layer to obtain a combined layer; and disposing a sensor inside the hollow.
 9. The method of claim 8, said providing the TFT layer comprising: depositing thin film transistors onto the TFT substrate, wherein the TFT substrate comprises glass; depositing a photoresist coating on the thin film transistors; modifying a photomask to include the mask, wherein the modified photomask comprises a plurality of protected areas and a plurality of unprotected areas, and wherein the mask is associated with the plurality of unprotected areas; and removing the plurality of unprotected areas to leave thin film transistors disposed on the TFT substrate in the plurality of protected areas.
 10. The method of claim 8, wherein said forming the hollow comprises: depositing an etching-resistant sealant on the plurality of layers, wherein the etching-resistant sealant is not deposited on the hollow corresponding to the mask, and wherein the etching-resistant sealant protects the plurality of layers from an etcher; submerging the plurality of layers in the etcher; and etching the hollow from the CF layer, the display layer, and the TFT layer, wherein the hollow associated with the CF layer, the display layer, and the TFT layer corresponds to the mask.
 11. The method of claim 8, wherein said forming the hollow comprises: upon said combining the CF layer, the display layer, and the TFT layer, forming the hollow within the combined layer, wherein the hollow corresponds to the mask.
 12. The method of claim 8, wherein said forming the hollow comprises: cutting with a diamond cutter the hollow from the CF layer, the display layer, and the TFT layer, wherein the hollow associated with the CF layer, the display layer, and the TFT layer corresponds to the mask.
 13. The method of claim 8, wherein the mask comprises a rectangular shape with at least one rounded corner. 